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en.wikipedia.org

Extreme ultraviolet lithography - Wikipedia

It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

www.asml.com

EUV lithography systems – Products | ASML

EUV lithography is important because it makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the most intricate layer...

www.zeiss.com

EUV lithography and technology | ZEISS SMT

EUV stands for "extreme ultraviolet" light. The light visible to humans has wavelengths between 400 and 800 nanometers. The range of ultraviolet light begins below 400 nanometers. The leading lithography process to da...